Electron Beam Deposition (E-Beam)

Electron Beam Deposition or e-beam deposition is a process used to coat optical components (e.g. lenses, filters, crystals, etc.,) with antireflection, high-reflection, scratch resistant, and other types of coatings. This process uses an electron-beam gun to boil electrons off of a heated cathode in order to melt the coating material. After the coating material is melted it will then evaporate on to the substrate (target material). This process takes place within a de-pressurized vacuum coating chamber.

Ion Assisted Deposition (IAD)

A coating technique which is used to improve the structure density of thin-film coatings by bombarding the growing film with accelerated ions of oxygen and argon. The kinetic energy then dissipates in the film, causing the condensed molecules to rearrange at greater density.¹ This process takes place within a de-pressurized vacuum coating chamber.

¹The Photonics Dictionary. Book 4. “Ion-Assisted Deposition.” P. D-74. 2008

² Photonics Dictionary. Book 4. “Sputtering.” P. D-137. 2008

³memsexchange,”Deposition Processes; Sputtering,” <http://www.memsnet.org/mems/processes/deposition.html>,2008

Ion Beam Sputtering (IBS)

A vacuum deposition method in which the coating material (target), is removed from the surface of the coating source (cathode) by ion bombardment and deposited upon substrates.² Sputtering is a technology in which the material is released from the source at much lower temperature than evaporation. The substrate is placed in a vacuum chamber with the source material, named a target, and an inert gas (such as argon) is introduced at low pressure. A gas plasma is struck using an RF power source, causing the gas to become ionized. The ions are accelerated towards the surface of the target, causing atoms of the source material to break off from the target in vapor form and condense on all surfaces including the substrate. As for evaporation, the basic principle of sputtering is the same for all sputtering technologies. The differences typically relate to the manor in which the ion bombardment of the target is realized. ³ This process takes place within a de-pressurized vacuum coating chamber.



thin films
coating technology